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单层Bi2O2S表面卤族元素钝化研究

Research on the passivation of halogen elements on the surface of monolayer Bi2O2S

  • 摘要: 为了拓展单层Bi2O2S的带隙可调控范围,采用第一性原理计算方法系统研究了单层Bi2O2S表面卤族元素YY为F, Cl, Br, I)钝化后的材料结构和电子特性。使用广义梯度近似(GGA-PBE)泛函和杂化密度泛函(HSE06)分别计算了单层Bi2O2S—YY为F, Cl, Br, I)体系的能带结构等,并对不同基组泛函所得结果进行了对比分析。结果表明,当表面采用F、Cl、Br、I不同终端原子钝化时,单层Bi2O2S的结构几乎保持不变;F、Cl、Br终端原子倾向于从裸露的Bi2O2S层获得电子,而I终端原子则倾向于丢失少量电子;钝化后的单层Bi2O2S具有可在较大范围内(1.249 eV~1.996 eV)调节的间接带隙,具体值取决于表面钝化的卤族元素Y种类。表面卤族元素钝化可以有效调节2维Bi2O2S的带隙,这对于2维Bi2O2S在光电等领域的应用具有一定指导意义。

     

    Abstract: In order to expand the range of bandgap value tuning for monolayer Bi2O2S, a systematic study of the material structure and electronic properties of monolayer Bi2O2S with halogen element Y (Y = F, Cl, Br, I) passivation on its surface was conducted using first-principles calculation methods. The band structures of Bi2O2S—Y (Y = F, Cl, Br, I) were calculated using the generalized gradient approximation (GGA-PBE) and the hybrid density functional (HSE06) , and the results obtained from different basis set functionals were compared.It is found that when the surface is passivated with different terminal atoms such as F, Cl, Br, and I, the structure of monolayer Bi2O2S remains almost unchanged. The F, Cl and Br atoms tend to obtain electrons from the bare Bi2O2S layer while the I terminations tend to lose electrons. The passivated monolayer Bi2O2S shows an indirect band gap that can be adjusted over a wide range (1.249 eV~1.996 eV), depending on the type of halogen element used for surface passivation Y. The research indicates that passivation with halogen elements on the surface can effectively modulate the bandgap of two-dimensional Bi2O2S, which holds certain guiding significant for its application in the field of optoelectronics.

     

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