[1] |
SHEN B,LI Y L,KAROLY N,et al.Electron injection by a nanowire in the bubble regime[J].Physics of Plasmas,2007,14 (5):053115/1-053115/5. |
[2] |
BLUMENFELD I,CLAYTON C E,DECKER F J,et al.Energy doubling of 42GeV electrons in ametre-scale plasma wakefield accelerator[J].Nature,2007,445(7129):741-744. |
[3] |
ESAREY E,SCHROEDER C B,LEEMANS W P.Physics of laserdriven plasma-based electron accelerators[J].Reviews of Modern Physics,2009,81(3):1229-1285. |
[4] |
TAJIMA T,DAWSON J M.Laser electron accelerator[J].Physics Review Letters,1979,43(4):267-270. |
[5] |
PUKHOV A,KOSTYUKOV I.Control of laser-wakefield acceleration by the plasma-density profile[J].Physics Review,2008,E77(2):025401/1-025401/2. |
[6] |
PUKHOV A,MEYER-TER-VEHN J.Laser wakefield acceleration: the highly non-linear broken-wave regime[J].Applied Physics, 2002,B74(4):355-361. |
[7] |
SPRANGLE P,ESAREY E,TING A.Nonlinear interaction of intense laser pulse in plasma[J].Physics Review,1990,A41(8): 4463-4469. |
[8] |
ESAREY E,SPRANGLE P,KRALL J,et al.Overview of plasmabased accelerator concepts[J].IEEE Transactions on Plasma Science,1996,24(2):252-288. |
[9] |
FAURE J,RECHATIN C,NORLIN A,et al.Controlled injection and acceleration of electrons in plasma wakefields by colliding laser pulses[J].Nature,2006,444(7120):737-739. |
[10] |
WANG X,ISCHEBECK R,MUGGLI P,et al.Positron injection and acceleration on the wake driven by an electron beam in a foiland-gas plasma[J].Physics Review Letters,2008,101(12): 124801/1-124801/4. |
[11] |
ESIRKEPOV T,BULANOV S V,YAMAGIWA M,et al.Electron, positron,and photon wakefield acceleration:trapping wake overtaking,and pondermotive acceleration[J].Physics Review Letters, 2006,96(1):014803/1-014803/4. |
[12] |
BULANOV S V,YAMAGIWA M,ESIRKEPOV T,et al.Spectral and dynamical features of the electron bunch accelerated by a shortpulse high intensity laser in an underdense plasma[J].Physics of plasmas,2005,12(7):073103/1-073103/11. |
[13] |
ZAKIR A,MAMAT M,AIMIDULA A,et al.Kinetic energy of accelerated electron in the laser-driven wakefield[J].Laser Technology,2010,34(3):422-424(in Chinese). |