Preparation of high power laser films based on ion beam assisted deposition

ZHANG Da-wei; HE Hong-bo; SHAO Jian-da; FAN Zheng-xiu

Volume 32 Issue 1

Apr. 2010

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Preparation of high power laser films based on ion beam assisted deposition

1.
College of Optics and Electron Information Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;
2.
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

Received Date: 2006-10-20
Accepted Date: 2007-01-17

Abstract

The progress in the application of ion beam assisted deposition on the preparation of high laser films was reviewed.Some key problems of this project were analyzed such as too high packing density,new defects introduced by ions,increased compressive stress etc.,and some ways of this project for the future were presented.
- thin films,
- ion beam assisted deposition,
- high power laser films,
- laser induced damage threshold

References

[1]	ZHU Y N.Discussion of the measurement methods for laser induced damage threshold of optical coating[J].Laser Technology,2006,30(5):532-535(in Chinese).
[2]	MA Z,LÜB D,XIAO Q.Laser damage mechanisms of optical coating under near threshold energy[J].Laser Technology,2000,24(3):145-147(in Chinese).
[3]	SHEN J,WANG J,WU G M,et al.Techniques and applications of sol-gel derived coatings[J].Atomic Energy Science and Technology,2002,36(4/5):305-308(in Chinese).
[4]	KOECHNER W.Solid state laser engineering[M].Beijing:SciencePress,2002:601(in Chinese).
[5]	ZORC H,SNOWDON K,JOHNSON R L,et al.A comparative study of the stability of hard oxide coatings produced with and without ion Assisted[C]//41st Annual Technical Conference Proceedings.Boston:Society of Vacuum Coaters,1998:243-247.
[6]	ZHANG D W,HONG R J,FAN S H,et al.The effect of ion current density in ion beam assisted deposition[J].Acta Phtonica Sinica,2005,34(3):477-480(in Chinese).
[7]	ZHANG D P,SHAO J D,ZHAO Y A,et al.LIDT of ZrO2 thin films prepared at different oxygen partial pressure by e-beam evaporation[J].J Vacuum Sci Technol,2005,A23(1):197-200.
[8]	ALVISI M,GIULIO M D,MARRONE S G,et al.HfO2 films with high laser damage threshold[J].Thin Sold Films,2000,358(1-2):250-258.
[9]	REICHLING M,BODEMANN A,KAISER N.Defect induced laser damage in oxide multilayer coatings for 248nm[J].Thin Solid Films,1998,320(20):264-279.
[10]	WELSCH E,ETTRICH K,BLASCHKE H,et al.Investigation of absorption induced damage in ultraviolet dielectric thin films[J].Opt Engng,1997,36(2):504-514.
[11]	REICHLING M,WELSCH E,LAN T,et al.Photothermal absorption microscopy of defects in ZrO2 and MgF2 films[J].Opt Engng,1994,33(4):1334-1342.
[12]	HU H Y,FAN Z X,LIU Y,et al.Effect of impurities on laser induced damage to 1.06μm optical coatings[J].Chinese Jorunal of Lasers,1999,A26(6):489-492(in Chinese).
[13]	ZHANG D W,FAN S H,ZHAO Y A,et al.High laser damage threshold HfO2 films prepared by Ion-assisted electron beam evaporation[J].Applied Surface Science,2005,243(1-4):232-237.
[14]	TANG X F,FAN Z X,WANG Z J.Laser-induced damage and optical properties of dual ion beam sputter deposited coatings[J].Acta Optica Sinica,1995,15(2):217-224(in Chinese).
[15]	GAO W D,ZHANG W L,FAN S H.Effects of the structure of HfO2 thin films on its laser-induced damage threshold[J].Acta Photonica Snica,2005,24(2):176-179(in Chinese).
[16]	FU X Y,KONG M D,MA P.Deposition of HfO2/SiO2 antireflective and high reflective optical thin film by plasma-IAD[J].Optical Technique,1998,24(3):91-93(in Chinese).
[17]	FU X Y,KONG M D,HU J P,et al.Deposition of multilayer for pulse laser mirror with high laser induced damage threshold[J].High Power Laser and Partical Beams,1999,11(4):413-417(in Chinese).
[18]	GILO M,CROITORU N.Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source[J].Thin Sold Films,1999,350(1):203-208.
[19]	ZHANG D P,SHAO J D,ZHANG D W,et al.Employing oxygen plasma post-treatment to improve LIDT of ZrO2 films prepared by electron beam evaporation method[J].Opt Lett,2004,29(24):2870-2872.
[20]	THIELSCH R,GATTO A,HEBER J,et al.A comparative study of the UV optical and structural properties of SiO2 ,Al2O3 ,and HfO2 single layers deposited by reactive evaporation,ion assisted deposition and plasma ion-assisted deposition[J].Thin Solid Films,2002,410(1-2):86-93.
[21]	MOHAN S,KRISHNA M G.A review of ion beam assisted deposition of optical thin films[J].Vacuum,1995,46(7):645-659.
[22]	FAN R Y,LU Y M.Ion-assisted deposition of optical thin films at different ion beam energies[J].Chinese Journal of Lasers,1991,18(5):353-356(in Chinese).
[23]	WILLEY R R,MELBOURNE F L.Improvements in gridless ion source performance[C]//38th Annual Technical Conference Proceedings.Boston:Society of Vacuum Coaters,1995:232-236.
[24]	ALVISI M,TOMASI F D,PERRONE M R.Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films[J].Thin Solid Films,2001,396(1-2):44-52.
[25]	ROBIC J Y,LEPLAN H,PAULEAU Y.Residual stress in silicon dioxide thin films produced by ion-assisted deposition[J].Thin Solid Films,1996,290-291:34-39.
[26]	ANDRE B,POUPINET L,RAVEL G.Evaporation and ion assisted deposition of HfO2 coatings-some key points for high power laser applications[J].J Vacuum Sci & Technol,2000,A18(5):2372-2377.
[27]	RAFAEL R M,TAKANORI M,IPPEI S.Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition[J].J Vacuum Sci Technol,2002,A20(2):549-554.

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通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

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Preparation of high power laser films based on ion beam assisted deposition

1. College of Optics and Electron Information Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;

2. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

Received Date: 2006-10-20

Accepted Date: 2007-01-17

Available Online: 2008-02-25

Abstract: The progress in the application of ion beam assisted deposition on the preparation of high laser films was reviewed.Some key problems of this project were analyzed such as too high packing density,new defects introduced by ions,increased compressive stress etc.,and some ways of this project for the future were presented.

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Reference (27)

[1]	ZHU Y N.Discussion of the measurement methods for laser induced damage threshold of optical coating[J].Laser Technology,2006,30(5):532-535(in Chinese).
[2]	MA Z,LÜB D,XIAO Q.Laser damage mechanisms of optical coating under near threshold energy[J].Laser Technology,2000,24(3):145-147(in Chinese).
[3]	SHEN J,WANG J,WU G M,et al.Techniques and applications of sol-gel derived coatings[J].Atomic Energy Science and Technology,2002,36(4/5):305-308(in Chinese).
[4]	KOECHNER W.Solid state laser engineering[M].Beijing:SciencePress,2002:601(in Chinese).
[5]	ZORC H,SNOWDON K,JOHNSON R L,et al.A comparative study of the stability of hard oxide coatings produced with and without ion Assisted[C]//41st Annual Technical Conference Proceedings.Boston:Society of Vacuum Coaters,1998:243-247.
[6]	ZHANG D W,HONG R J,FAN S H,et al.The effect of ion current density in ion beam assisted deposition[J].Acta Phtonica Sinica,2005,34(3):477-480(in Chinese).
[7]	ZHANG D P,SHAO J D,ZHAO Y A,et al.LIDT of ZrO2 thin films prepared at different oxygen partial pressure by e-beam evaporation[J].J Vacuum Sci Technol,2005,A23(1):197-200.
[8]	ALVISI M,GIULIO M D,MARRONE S G,et al.HfO2 films with high laser damage threshold[J].Thin Sold Films,2000,358(1-2):250-258.
[9]	REICHLING M,BODEMANN A,KAISER N.Defect induced laser damage in oxide multilayer coatings for 248nm[J].Thin Solid Films,1998,320(20):264-279.
[10]	WELSCH E,ETTRICH K,BLASCHKE H,et al.Investigation of absorption induced damage in ultraviolet dielectric thin films[J].Opt Engng,1997,36(2):504-514.
[11]	REICHLING M,WELSCH E,LAN T,et al.Photothermal absorption microscopy of defects in ZrO2 and MgF2 films[J].Opt Engng,1994,33(4):1334-1342.
[12]	HU H Y,FAN Z X,LIU Y,et al.Effect of impurities on laser induced damage to 1.06μm optical coatings[J].Chinese Jorunal of Lasers,1999,A26(6):489-492(in Chinese).
[13]	ZHANG D W,FAN S H,ZHAO Y A,et al.High laser damage threshold HfO2 films prepared by Ion-assisted electron beam evaporation[J].Applied Surface Science,2005,243(1-4):232-237.
[14]	TANG X F,FAN Z X,WANG Z J.Laser-induced damage and optical properties of dual ion beam sputter deposited coatings[J].Acta Optica Sinica,1995,15(2):217-224(in Chinese).
[15]	GAO W D,ZHANG W L,FAN S H.Effects of the structure of HfO2 thin films on its laser-induced damage threshold[J].Acta Photonica Snica,2005,24(2):176-179(in Chinese).
[16]	FU X Y,KONG M D,MA P.Deposition of HfO2/SiO2 antireflective and high reflective optical thin film by plasma-IAD[J].Optical Technique,1998,24(3):91-93(in Chinese).
[17]	FU X Y,KONG M D,HU J P,et al.Deposition of multilayer for pulse laser mirror with high laser induced damage threshold[J].High Power Laser and Partical Beams,1999,11(4):413-417(in Chinese).
[18]	GILO M,CROITORU N.Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source[J].Thin Sold Films,1999,350(1):203-208.
[19]	ZHANG D P,SHAO J D,ZHANG D W,et al.Employing oxygen plasma post-treatment to improve LIDT of ZrO2 films prepared by electron beam evaporation method[J].Opt Lett,2004,29(24):2870-2872.
[20]	THIELSCH R,GATTO A,HEBER J,et al.A comparative study of the UV optical and structural properties of SiO2 ,Al2O3 ,and HfO2 single layers deposited by reactive evaporation,ion assisted deposition and plasma ion-assisted deposition[J].Thin Solid Films,2002,410(1-2):86-93.
[21]	MOHAN S,KRISHNA M G.A review of ion beam assisted deposition of optical thin films[J].Vacuum,1995,46(7):645-659.
[22]	FAN R Y,LU Y M.Ion-assisted deposition of optical thin films at different ion beam energies[J].Chinese Journal of Lasers,1991,18(5):353-356(in Chinese).
[23]	WILLEY R R,MELBOURNE F L.Improvements in gridless ion source performance[C]//38th Annual Technical Conference Proceedings.Boston:Society of Vacuum Coaters,1995:232-236.
[24]	ALVISI M,TOMASI F D,PERRONE M R.Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films[J].Thin Solid Films,2001,396(1-2):44-52.
[25]	ROBIC J Y,LEPLAN H,PAULEAU Y.Residual stress in silicon dioxide thin films produced by ion-assisted deposition[J].Thin Solid Films,1996,290-291:34-39.
[26]	ANDRE B,POUPINET L,RAVEL G.Evaporation and ion assisted deposition of HfO2 coatings-some key points for high power laser applications[J].J Vacuum Sci & Technol,2000,A18(5):2372-2377.
[27]	RAFAEL R M,TAKANORI M,IPPEI S.Growth and structure control of HfO2-x films with cubic and tetragonal structures obtained by ion beam assisted deposition[J].J Vacuum Sci Technol,2002,A20(2):549-554.

Preparation of high power laser films based on ion beam assisted deposition

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通讯作者: 陈斌, bchen63@163.com

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Preparation of high power laser films based on ion beam assisted deposition

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