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Volume 24 Issue 1
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Citation:
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Study of marking to enamelware with excimer laser

  • 1.

    Department of Physics, Yunnan University, Kunming, 650091

  • Received Date: 1998-11-23
    Accepted Date: 1999-02-05
  • The experiments of marking to enamelware with 308nm excimer laser are finished. A fine and visible pattern can be acquired when the enamelware sample is irradiated by one or several 308nm excimer laser pulses if their fluences are over the marking threshold. The marking fluence threshold is far lower than that based on the vaporizing and etching principle. The marking mechanism is studied in this paper and the conditions of marking are optimized in experiments.
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  • [1] 寻鹏．激光与红外,1991;21(6):6～9
    [2] 梅遂生．激光与红外,1994;24(1):5～8
    [3] 叶震寰,董景星,楼祺洪 et al．中国激光,1995;22(4):305～308
    [4] 邵规贤,苟文彬,闻瑞昌 et al．搪瓷学．北京:轻工业出版社,1983:5～81
    [5]

    Sowada U,Kablert H J,Basting D.Excimer laser material processing-Methods and Results．Lambda Industrial,1988;(4)
    [6]

    Sowada U,Lokai P,Kablert H J et al.Excimer Laser Processing of Ceramic Workpieces-results and Physical Process．Lambda Industrial,1989;(6)
    [7] 文小明,谢崇伟,林理忠 et al．物理学报,1996;46(8):1652
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Study of marking to enamelware with excimer laser

  • 1. Department of Physics, Yunnan University, Kunming, 650091
  • Received Date: 1998-11-23
  • Accepted Date: 1999-02-05
  • Available Online: 2000-01-25

Abstract: The experiments of marking to enamelware with 308nm excimer laser are finished. A fine and visible pattern can be acquired when the enamelware sample is irradiated by one or several 308nm excimer laser pulses if their fluences are over the marking threshold. The marking fluence threshold is far lower than that based on the vaporizing and etching principle. The marking mechanism is studied in this paper and the conditions of marking are optimized in experiments.

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