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Volume 29 Issue 4
Sep.  2013
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Citation:

Nondestructive testing method for dielectric reflection grating

  • Received Date: 2004-03-07
    Accepted Date: 2004-11-26
  • The efficiency of dielectric reflection grating was calculated with C method theoretically.Characteristics of the photoresist grating mask were obtained from SEM pictures and the curves of grating efficiency were presented.The trend of these curves had some relationships with correspondent masks' characteristics.So,a nondestructive testing method with the characteristic spectrum of efficiency to estimate the groove of grating was put forward.It is concluded that this method is useful to determine whether the photoresist has been developed to the basement which is the key in manufacture technology of grating mask.
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    CHANDEZON J,MAYSTRE D,RAOULT G.A new theoretical method for diffraction gratings and it' s numerical applications [J].J Opt,1980,11(4):235~241.
    [2]

    SHORE B W,LI L F.Design of high-efficiency dielectric reflection gratings [J].J O S A,1997,A14(5):1124~1135.
    [3]

    CHANDEZON J,DUPUIS M T,GORNET G et al.Multicoated gratings: a differential formalism applicable in the entire optical region [J].J O S A,1982,72(7):839~846.
    [4]

    LI L F,CHANDEZON J,DRANET G et al.Rigorous and efficient grating-analysis method made easy for optical engineers [J].Appl Opt,1999,38(2):304~313.
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  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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Nondestructive testing method for dielectric reflection grating

  • 1. Institute of Information Optical Engineering, Soochow University, Suzhou 215006, China

Abstract: The efficiency of dielectric reflection grating was calculated with C method theoretically.Characteristics of the photoresist grating mask were obtained from SEM pictures and the curves of grating efficiency were presented.The trend of these curves had some relationships with correspondent masks' characteristics.So,a nondestructive testing method with the characteristic spectrum of efficiency to estimate the groove of grating was put forward.It is concluded that this method is useful to determine whether the photoresist has been developed to the basement which is the key in manufacture technology of grating mask.

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