Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma
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National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin 150001, China
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Received Date:
2004-02-16
Accepted Date:
2004-05-20
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Abstract
The present status of extreme ultraviolet(EUV) source based on laser induced plasma(LIP) and discharge induced plasma(DIP) is reviewed.The characteristics and the progresses of LIP and DIP are compared.In general, discharge induced pinch plasma is of special interest,for its cost is expected to be much lower than that of LIP.
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References
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Proportional views
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