Effect of pumping parameters of electron beam on the third continuum of argon

Zhao Yongpeng; Wang Qi; Liu Jincheng

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Volume 27 Issue 2

Sep. 2013

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Article Navigation > LASER TECHNOLOGY > 2003 > 27(2): 137-139

Citation:

Effect of pumping parameters of electron beam on the third continuum of argon

1.
National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin, 150001

Received Date: 2002-02-05
Accepted Date: 2002-04-05

Abstract

The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.
- electron beam,
- diode,
- the third continuum

References

[1]	Robert E,Cachoncinlle C,Pouvesle J M et al. SPIE,2000,4071:240～247.
[2]	Boichenko A M,Tarasenko V F,Fedenev A V et al. Quantum Electron,1997,27: 679～685.
[3]	Sauerbrey R,Emmert F,Langhoff H. J Phys B: At Mol Phys,1984,17: 2057～2074.
[4]	Amirov A Kh,Korshunov O V,Chinnov V F. J Phys B: At Mol Opt Phys,1994,27: 1753～1771.
[5]	Arteev M S,Kuznetsov A A,Sulakshin S S et al. Opt Spectrosc (USSR),1987,63(3): 399～401.
[6]	Klein G,Carvalho M J. J Phys B: At Mol Phys,1981,14:1283～1290.
[7]	Strickler T D,Arakawa E T. J Chem Phys,1964,41(6): 1783～1789.
[8]	Robert E,Khacef A,Cachoncinlle C et al. Opt Commun,1995,117: 179～188.
[9]	Langhoff H. Opt Commun,1988,68(1):31～34.
[10]	Cachoncinlle C,Pouvesle J M,Durand G et al. J Chem Phys,1992,96(8): 6093～6103.
[11]	赵永蓬,王振胥,王骐. 强激光与粒子束,1997,9(4): 625.
[12]	赵永蓬,王骐,高劭宏 et al. 中国激光,2000,27(2): 123.

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通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

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Effect of pumping parameters of electron beam on the third continuum of argon

1. National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin, 150001

Received Date: 2002-02-05
Accepted Date: 2002-04-05
Available Online: 2003-03-25

Abstract: The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.

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Reference (12)

[1]	Robert E,Cachoncinlle C,Pouvesle J M et al. SPIE,2000,4071:240～247.
[2]	Boichenko A M,Tarasenko V F,Fedenev A V et al. Quantum Electron,1997,27: 679～685.
[3]	Sauerbrey R,Emmert F,Langhoff H. J Phys B: At Mol Phys,1984,17: 2057～2074.
[4]	Amirov A Kh,Korshunov O V,Chinnov V F. J Phys B: At Mol Opt Phys,1994,27: 1753～1771.
[5]	Arteev M S,Kuznetsov A A,Sulakshin S S et al. Opt Spectrosc (USSR),1987,63(3): 399～401.
[6]	Klein G,Carvalho M J. J Phys B: At Mol Phys,1981,14:1283～1290.
[7]	Strickler T D,Arakawa E T. J Chem Phys,1964,41(6): 1783～1789.
[8]	Robert E,Khacef A,Cachoncinlle C et al. Opt Commun,1995,117: 179～188.
[9]	Langhoff H. Opt Commun,1988,68(1):31～34.
[10]	Cachoncinlle C,Pouvesle J M,Durand G et al. J Chem Phys,1992,96(8): 6093～6103.
[11]	赵永蓬,王振胥,王骐. 强激光与粒子束,1997,9(4): 625.
[12]	赵永蓬,王骐,高劭宏 et al. 中国激光,2000,27(2): 123.

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Effect of pumping parameters of electron beam on the third continuum of argon

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通讯作者: 陈斌, bchen63@163.com

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Effect of pumping parameters of electron beam on the third continuum of argon

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