Research status of deep ultraviolet lithography with 193nm excimer-laser
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Received Date:
1998-10-29
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Abstract
The optical lithography using the 193nm excimer-laser is a key technique for decreasing feature size of very large scale integration(VLSI) at the beginning of the next century and has become one of the chal lenge topics in the high-tech research areas.The optical system design,optics materials, excimer-laser source,resists for 193nm and its application in fabrication of CMOS devices are described in this paper.
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