Research on growth rate uniformity in horizontal MOCVD systems
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Received Date:
1993-05-08
Accepted Date:
1993-06-14
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Abstract
This paper discusses the main factor of affecting growth rate in MOCVD system,such as the flow rate of carriers gas and organometallic source, position of substrate,doping and undoping, etc.The experimental results are discussed and comparedwith other literatures.The lateral uniformity problem has been emphasizes.
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Proportional views
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