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Volume 15 Issue 6
Sep.  2013
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Citation:

Real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering using laser interferometry

  • Received Date: 1990-12-29
    Accepted Date: 1991-06-03
  • this paper presents a new method of real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering device with laser.TCJ-300 type isoaxis magnetron sputter machine is made in our institute.The experimental results show that this method has more adwantages than other methods of monitoring film thickness have.It can show the homogeneity and the thickness of the film as well as the sputtering velocity in process of sputtering.The experimental set and its operation are simple.The monitoring accuracy of the thick of film is better than 1.5%.
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  • [1]

    Xie Kecheng,International Conference on Optoelectronic Scienceand Engineering,ICOESE '90,Beijing China,August 1990,Washington USA:SPIE,1990:443-444
    [2]

    Macleod H A,Appl Opt,1981;20 (1):82-89
    [3]

    Schiller S,Heisig U,Goedicke K.Thin Solid Films,19781 54(1):33
    [4]

    Van Vouros T.Opt Spectra,1977,11:30
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通讯作者: 陈斌, bchen63@163.com
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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Real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering using laser interferometry

  • 1. Sichuan Institute of Piezoelectric and Acousto-Optic Technology

Abstract: this paper presents a new method of real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering device with laser.TCJ-300 type isoaxis magnetron sputter machine is made in our institute.The experimental results show that this method has more adwantages than other methods of monitoring film thickness have.It can show the homogeneity and the thickness of the film as well as the sputtering velocity in process of sputtering.The experimental set and its operation are simple.The monitoring accuracy of the thick of film is better than 1.5%.

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