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Volume 15 Issue 5
Sep.  2013
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Advances in deposition techniques of laser-assisted solid state thin film

  • Received Date: 1990-08-17
  • This atticle reviews recent advances in deposition technique of laser-assisted solid state thin films.The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition(PLED) and laser-induced chemical vapor deposition(LCVD) are simply introduce.Applications of this technique in preparing the thin films,such as high-T.superconductive films,metallic films,semi-conductive films and insulation films,used in microelectronic elements are thoroughly presented.
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Advances in deposition techniques of laser-assisted solid state thin film

  • 1. Department of Electronics, Hebei University

Abstract: This atticle reviews recent advances in deposition technique of laser-assisted solid state thin films.The basic principles, deposition systems and laser sources of pulsed laser evaporation deposition(PLED) and laser-induced chemical vapor deposition(LCVD) are simply introduce.Applications of this technique in preparing the thin films,such as high-T.superconductive films,metallic films,semi-conductive films and insulation films,used in microelectronic elements are thoroughly presented.

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