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Volume 42 Issue 6
Nov.  2018
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Evaluation of beam quality of semiconductor lasers by beam parameter product

  • Corresponding author: YANG Xiaojing, yangxj84@163.com
  • Received Date: 2017-12-03
    Accepted Date: 2018-03-20
  • In order to solve the deficiency of the traditional evaluation method of beam parameter product on laser beam quality, based on the characteristics of semiconductor laser beam, the effective focal length data of 6 combined beams of fast axis collimator (FAC) with focal length 1100μm, 6 combined beams of FAC with focal length 600μm, and 10 combined beams of FAC with focal length 600μm were obtained. The theoretical analysis and experimental verification were carried out. The results show that the more obvious the change of L// and θ is, the more obvious the change of beam parameter product of beam quality is. The error between the measured value and the calculated value is generally less than 5%. This result is helpful for evaluating the beam quality of high energy laser.
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    CAO Ch, WEBER H. The problem with M2[J]. Optics & Laser Technology, 2016, 32(8):221-224.
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    GUO H P, WAN Ch H, XU Ch W, et al. Study on dynamic mode stability of external cavity diode lasers. Laser Technology, 2016, 40(5):706-711(in Chinese).
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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Evaluation of beam quality of semiconductor lasers by beam parameter product

    Corresponding author: YANG Xiaojing, yangxj84@163.com
  • 1. College of Computer and Information Engineering, Anyang Normal University, Anyang 455000, China
  • 2. International WIC Institute, Beijing University of Technology, Beijing 100124, China
  • 3. School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China

Abstract: In order to solve the deficiency of the traditional evaluation method of beam parameter product on laser beam quality, based on the characteristics of semiconductor laser beam, the effective focal length data of 6 combined beams of fast axis collimator (FAC) with focal length 1100μm, 6 combined beams of FAC with focal length 600μm, and 10 combined beams of FAC with focal length 600μm were obtained. The theoretical analysis and experimental verification were carried out. The results show that the more obvious the change of L// and θ is, the more obvious the change of beam parameter product of beam quality is. The error between the measured value and the calculated value is generally less than 5%. This result is helpful for evaluating the beam quality of high energy laser.

引言
  • 随着对半导体激光器光束质量的要求越来越高, 对半导体激光器光束质量参量的研究非常急迫。例如:聚焦点大小、远场散度角、时间衍射限制参量β、光束参量积(beam parameter products, BPP)因子和M2因子等。由于不同的定义和方法导致其结果不同[1], 所以至今没有一个参量积因子能够有效地评估高能半导体激光器的光束质量。因此, 研究激光的光束质量参量积因子非常必要[2-3]

    由于多发射半导体激光芯片[4-5]性能可靠、成本低而被广泛应用。许多文献中都对光束质量的评估进行了讨论[6-8]。参考文献[9]和参考文献[10]中研究了半导体激光器的通用性和适应性中的光束质量参量积Mq2因子, 并对其进行了初步验证。众所周知, M2因子不适合评价高能激光的光束质量。高能激光的谐振腔一般是非稳腔, 输出的激光光束不规则, 不存在光腰。而且, 对于能量分布离散型的高能激光光束, 由二阶矩定义计算得到的光斑半径与实际相差也很远, 因而得到的M2因子误差很大。M2因子要求光束截面的光强分布不能有陡直边缘, 比如对于超高斯光束, M2因子就不适用。

    作者采用参考文献[9]中提出的光束参量积Mq2因子对半导体激光器高能激光的光束质量进行评估。研究了各种因素, 特别是准直和聚焦透镜对光束质量的影响。采用光束质量参量积Mq2因子解释半导体激光器的准直效果, 通过叠加几个信号发射器芯片来调节多发射极半导体激光器聚焦透镜, 从而系统验证了Mq2的有效性。

1.   理论分析
  • 下面采用光束质量参量积Mq2评估光束质量, 并解释叠加信号发射极芯片调节多发射半导体激光聚焦透镜的准直效应。光束质量参量积Mq2因子为:

    式中, N//N分别是激光二极管沿着慢速轴和快速轴方向的数目; L//L分别是准直和聚焦透镜沿着慢速轴和快速轴方向的近距离射束宽度; θ//θ分别是准直和聚焦透镜沿着慢速和快速轴方向的远距离射束角度; $^{{k_ \bot }} = \frac{{{N_ \bot } \cdot {\theta _ \bot }}}{{({N_ \bot } \cdot {\theta _ \bot } + {N_{//}} \cdot {\theta _{//}})/2}} > 1$和${k_{//}} = \frac{{{N_{//}} \cdot {\theta _{//}}}}{{({N_ \bot } \cdot {\theta _ \bot } + {N_{//}} \cdot {\theta _{//}})/2}} < 1$, 分别是准直和聚焦透镜沿着慢速和快速轴方向的权重因子, 可用于主要影响因子对准直的正确定位; 指数变化对像散现象的影响见公式:F(As)=exp(As/λ), λ是激光束波长, As是散光距离。通过准直聚焦镜研究半导体激光芯片。

    由此可知, Mq2是对准直聚焦镜光束质量的评估因子, L//θ是影响Mq2的关键因素。

2.   实验分析
  • 为了验证半导体激光芯片对准直和聚焦透镜的影响, 参考了参考文献[10]中的方法设计了实验。如图 1所示, 选择输出功率为9W、波长为915nm±10nm的商业激光芯片。采用快速轴方向上有效焦距长度(effective focal length, EFL)等于慢轴方向上有效焦距长度的聚焦透镜。设置慢轴准直(slow axis collimator, SAC)的有效焦距长度直到光束有效自准。开始测试、记录并处理实验数据, 然后填入下列表格中。本文中只考虑As=0(单位归一化)的情况(通过透镜消除后的像散现象)。

    Figure 1.  Simulation of stacking multilayer diode laser chip

    (1)本文中考虑快轴准直焦距(fast axis collimator, FAC)的影响。结合2个不同的FAC透镜(EFL为600μm和EFL为1100μm)6个芯片的结果。比较表 1表 2发现, FAC透镜的EFL减小, Mq2的值减小, 表明此条件下光束质量较好。

    parameter measurement calculation difference/%
    EFL of 100.1mm L/μm 149.0 138.6 6.1
    L///μm 811.0 801.4 7.2
    N·θ/mrad 6.2 6.2 0.1
    N//·θ///mrad 0.7 0.7 1.9
    Mq2/(mm·mrad) 7.8 7.8 0.4
    EFL of 49.8mm L/μm 81.3 69.8 9.1
    L///μm 382.6 402.6 2.9
    N·θ/mrad 12.4 9 0.2
    N//·θ///mrad 0.7 0.9 1.8
    Mq2/(mm·mrad) 15.4 14.3 4.1
    EFL of 8mm L/μm 12.9 12.4 14.1
    L///μm 59.4 59.8 0.9
    N·θ/mrad 71.3 70.5 0.2
    N//·θ///mrad 6.2 6.5 1.9
    Mq2/(mm·mrad) 89.7 79.6 8.1

    Table 1.  Measurements and calculations for 6 combined beams using an 1100μm FAC (N=6, N//=1, As=0)

    parameter measurement calculation difference/%
    EFL of 100.1mm L/μm 301.1 284.3 4.1
    L///μm 698.9 785.6 6.3
    N·θ/mrad 2.9 3.2 1.1
    N//·θ///mrad 0.4 0.6 0.8
    Mq2/(mm·mrad) 3.1 3.1 2.1
    EFL of 49.8mm L/μm 151.2 142.6 5.2
    L///μm 402.4 412.7 4.1
    N·θ/mrad 5.9 5.9 1.3
    N//·θ///mrad 0.9 0.9 1.0
    Mq2/(mm·mrad) 4.8 4.6 2.9
    EFL of 8mm L/μm 12.9 19.9 2.9
    L///μm 62.7 63.5 0.9
    N·θ/mrad 40.1 39.4 1.3
    N//·θ///mrad 5.9 5.6 1.0
    Mq2/(mm·mrad) 29.8 26.8 4.2

    Table 2.  Measurements and calculations for 6 combined beams using a 600μm FAC (N=6, N//=1, As=0)

    (2) 研究激光二极管数目的影响。比较表 2表 3可知, 增加激光二极管数目, Mq2的值变大, 光束质量变差。

    parameter measurement calculation difference/%
    EFL of 100.1mm L/μm 286.2 259.2 4.1
    L///μm 741.9 769.3 4.9
    N·θ/mrad 9.1 7.9 0.3
    N//·θ///mrad 0.4 0.4 1.9
    Mq2/(mm·mrad) 22.6 22.6 0.2
    EFL of 49.8mm L/μm 139.7 129.5 6.1
    L///μm 402.4 421.1 3.9
    N·θ⊥/mrad 17.1 17.0 0.4
    N//·θ///mrad 0.8 0.8 1.9
    Mq2/(mm·mrad) 51.6 49.8 2.1
    EFL of 8mm L/μm 19.9 18.7 2.8
    L///μm 59.2 59.8 0.8
    N·θ/mrad 122.6 122.1 0.3
    N//·θ///mrad 5.8 5.3 1.9
    Mq2/(mm·mrad) 305.9 303.4 1.6

    Table 3.  Measurements and calculations for 10 combined beams using a 600μm FAC (N=6, N//=1, As=0)

    (3) 考虑不同聚焦透镜的影响。表 1~表 3中分别比较EFL为100.1mm, 49.8mm和8mm约3个透镜。发现聚焦透镜的EFL减少和Mq2值增加引起焦点变大, 光束质量变好。以上所述, 光束质量参量积Mq2因子能够有效反映FAC的EFL、激光二极管的数目和聚焦透镜的EFL。

    表 1表 2表 3中可知, L//θ是光束质量的主要影响因素。L//θ的变化越明显, 光束质量参量积Mq2因子的变化越明显。光束质量参量积Mq2因子的变化非常显著, 测量值和计算值之间的误差一般小于5%。因此, 光束质量参量积Mq2因子能够有效评估高能激光的光束质量。

3.   结论
  • 光束质量参量积Mq2因子不仅可以评估半导体激光的光束质量, 评估准直和聚焦透镜半导体激光芯片的光束质量, 也能有效反映影响FAC的EFL、激光二极管的数目和聚焦透镜的EFL。结果表明, Mq2因子适合评估高能激光的光束质量。

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