Study on the processing of glass micro channels with 248nm excimer laser

TIAN Shanshan; CHEN Tao

doi:10.7510/jgjs.issn.1001-3806.2016.05.014

In order to improve the efficiency and quality in processing the glass micro channels, excimer laser (=248nm) was used. The relationship between laser parameters and etching quality of glass were obtained after theoretical analysis and experimental verification. The results show that the threshold of laser processing micro channels in glass is 4.54103mJ/mm2. Etching depth increases approximately logarithmically with the increasing of laser energy. The relationship between laser energy and eching depth was described by two linear fitting formulas. Etching depth increases linearly with the increasing of pulse frequency. The relationship between pulse frequency and eching depth was described by linear fitting formula. The roughness of channel bottom increases with the increasing of laser energy and pulse frequency. In the processing of glass micro channels, the optimum range of laser parameters is laser energy 400mJ~600mJ and pulse frequency 4Hz~7Hz. The results are helpful for selecting the laser parameters reasonably to improve processing efficiency and quality of glass micro channels.

Study on the processing of glass micro channels with 248nm excimer laser

Corresponding author: CHEN Tao, chentao@bjut.edu.cn

1. College of Laser Engineering, Beijing University of Technology, Beijing 100022, China

Received Date: 2015-08-10

Accepted Date: 2015-10-08

Available Online: 2016-09-25

Abstract: In order to improve the efficiency and quality in processing the glass micro channels, excimer laser (=248nm) was used. The relationship between laser parameters and etching quality of glass were obtained after theoretical analysis and experimental verification. The results show that the threshold of laser processing micro channels in glass is 4.54103mJ/mm2. Etching depth increases approximately logarithmically with the increasing of laser energy. The relationship between laser energy and eching depth was described by two linear fitting formulas. Etching depth increases linearly with the increasing of pulse frequency. The relationship between pulse frequency and eching depth was described by linear fitting formula. The roughness of channel bottom increases with the increasing of laser energy and pulse frequency. In the processing of glass micro channels, the optimum range of laser parameters is laser energy 400mJ~600mJ and pulse frequency 4Hz~7Hz. The results are helpful for selecting the laser parameters reasonably to improve processing efficiency and quality of glass micro channels.

HTML

Reference (15)

[1]	SMEGKAL P,BREADMORE M C,GUIJTR M,et al.Separation of carboxylic acids in human serum by isotachophoresis using acommercial field-deployable analytical platform combined with in-house glass microfluidic chips[J].Analytica Chimica Acta,2012,755(22):115-120.
[2]	XU Zh,WEN J K,LIU Ch,et al.Research on forming and application of U-form glass micro-nanofluidic chip with long nanochannels[J].Microfluidics and Nanofluidics,2009,7(3):423-429.
[3]	YE J M,WANG X D,ZHUANG J L,et al.Microcontact electrochemical etching technique for rapid fabrication of glass-based microfluidic chips[J].RSC Advances,2013,19(3):6960-6963.
[4]	ZHOU J.A coating method of glass microchip for capillary electrophoretic separation and detection of DNA fragments[D].Shenyang:China Medical University,2006:9-25(in Chinese).
[5]	LUO Y,LOU Zh F,CHU D N,et al.Fabrication of glass microfluidic chip[J].Nanotechnology and Precision Engineering,2004,2(1):20-23(in Chinese).
[6]	LI Sh X,BAI Zh Ch,HUANG Zh,et al.Breakdown model of micro channels fabrication in fused silica substrates by laser-induced plasma[J].LaserInfrared,2011,41(9):969-973(in Chinese).
[7]	PENG Ch P.Study on laser machining micro channels on quartz[D].Guiyang:Guizhou University,2007:19-25(in Chinese).
[8]	DAI Y T,CUI J L,XU G,et al.Influence of laser parameters on etching performance during 157nm laser micromachining[J].Laser Technology,2011,35(1):36-38(in Chinese).
[9]	JIANG Ch,WANG Y Q.Study on machining K9 optical glass with KrFexcimer laser[J].ElectromachiningMould,2003(2):33-35(in Chinese).
[10]	LI L.The Research of 248nm excimer laser interaction with threeKinds of inorganic nonmetal optical materials[D].Wuhan:Wuhan University of Technology,2014:39-44(in Chinese).
[11]	BASTING D,STAMM U.The development of excimerlaser technology-history and future prospects[J].International Journal of Research in Physical Chemistry and Chemical Physics,2001,215(15):75-99.
[12]	LEE S K,YOON K K,WHANG K H,et al.Excimer laser ablation removal of thin chromium films from glass substrates[J].Surface and Coatings Technology,1999,113(1):63-74.
[13]	BASTING D,PIPPERT K,STAMM U.History and futureprospects of excimerlasers[J].Proceedings of the SPIE,2002,4426:25-34.
[14]	LOU Q H,XU J,FU Sh F,et al.Pulsed gas-discharge lasers[M].Beijing:Science Press,1993:238-293(in Chinese).
[15]	ZUO T Ch.Advanced manufacturing 21 century-laser technology and engineering[M].Beijing:Science Press,2007:363-375(in Chin-ese).

Study on the processing of glass micro channels with 248nm excimer laser

Abstract

References

Proportional views

通讯作者: 陈斌, bchen63@163.com

Proportional views