Effect of phase changes of interference fringes on exposure of plane holographic gratings
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1.
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
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Received Date:
2015-03-18
Accepted Date:
2015-04-15
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Abstract
In order to evaluate the performance of plane holographic grating exposure system and study the influence of interference fringe's phase changes on grating manufacture, based on exposure dose expression and binary model of grating mask profile, the effect of fringe's phase vibration on exposure contrast, grating mask profile and exposure phase were analyzed by theoretical analysis and numerical calculation. The results show that all kinds of interference fringe low-frequency drift decrease exposure contrast and the controllability of grating mask profile is reduced. The influence has consistency. For keeping the exposure contrast greater than 0.95, root mean square(RMS) value of low-frequency drift needs to be controlled in the range of 0.05 fringe's period. The effect of small amplitude high frequency vibration on grating exposure can be neglected. Exposure phase error caused by low-frequency shift doesn't impact diffractive characteristic of grating. For getting qualified grating mask, the matching relationship between photoresist nonlinearity and exposure should be controlled and RMS of low frequency drift should be smaller than 1/20 fringe's period which can be used to evaluate the stability of holographic grating exposure system.
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