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Volume 39 Issue 6
Sep.  2015
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Study on stress controlling technology of HfO2/SiO2 high-refractive coating

  • Received Date: 2014-09-01
    Accepted Date: 2014-12-10
  • Thin film deposited by physical vapor deposition usually has stress. In order to prevent high-refractive (HR) coating stress from destroying the surface of the substrate, the stress of the film prepared by electron beam evaporation was measured with a digital wavefront interferometer. The affecting factors of stress of optical dielectric coating were discussed. HfO2 and SiO2 were alternatively deposited on the substrate surface. As high refractive material, HfO2 layers were in tensile stress. As lower refractive material, SiO2 layers were in compressed stress. The results show that the stress is balanced by adjusting the oxygen pressure and the evaporation rate of coating material under stable experimental conditions. HfO2/SiO2 HR coatings have high damage thresholds.
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Study on stress controlling technology of HfO2/SiO2 high-refractive coating

  • 1. Chengdu Fine Optical Engineering Research Center, Chengdu 610041, China

Abstract: Thin film deposited by physical vapor deposition usually has stress. In order to prevent high-refractive (HR) coating stress from destroying the surface of the substrate, the stress of the film prepared by electron beam evaporation was measured with a digital wavefront interferometer. The affecting factors of stress of optical dielectric coating were discussed. HfO2 and SiO2 were alternatively deposited on the substrate surface. As high refractive material, HfO2 layers were in tensile stress. As lower refractive material, SiO2 layers were in compressed stress. The results show that the stress is balanced by adjusting the oxygen pressure and the evaporation rate of coating material under stable experimental conditions. HfO2/SiO2 HR coatings have high damage thresholds.

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