Synchronous control for MOPA excimer laser systems

QIAN Xiaodong; LI Xiru; LIANG Xu; BAO Jian; ZHANG Shuo

doi:10.7510/jgjs.issn.1001-3806.2015.02.019

In order to achieve synchronous discharge of dual-chambers of an ArF excimer laser based on master oscillation power amplifier(MOPA) structure, synchronization logic was used to respond to dual-chamber discharge timing sequence quickly. According to synchronization control logic, an automatic precision adjustment to dual-chamber delay was made. Coarse search was implemented by using a high-speed synchronous modulo-16 binary counter and dual-chamber delay difference was narrowed quickly. Small precision delay adjustment was achieved by using universal digital programmable delay chip. The results show that discharge time differences steadies at about 23ns less than ±3ns synchronization jitter after dual-chamber discharge synchronous adjustment. It can meet MOPA structure excimer laser synchronous control requirements under high repetition frequency of 4kHz.

Synchronous control for MOPA excimer laser systems

Corresponding author: BAO Jian, baojian_@sohu.com;

1. Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Science, Hefei 230031, China

Received Date: 2014-02-26

Accepted Date: 2014-03-18

Available Online: 2015-03-25

Abstract: In order to achieve synchronous discharge of dual-chambers of an ArF excimer laser based on master oscillation power amplifier(MOPA) structure, synchronization logic was used to respond to dual-chamber discharge timing sequence quickly. According to synchronization control logic, an automatic precision adjustment to dual-chamber delay was made. Coarse search was implemented by using a high-speed synchronous modulo-16 binary counter and dual-chamber delay difference was narrowed quickly. Small precision delay adjustment was achieved by using universal digital programmable delay chip. The results show that discharge time differences steadies at about 23ns less than ±3ns synchronization jitter after dual-chamber discharge synchronous adjustment. It can meet MOPA structure excimer laser synchronous control requirements under high repetition frequency of 4kHz.

HTML

Reference (14)

[1]	ZHANG H B, LOU Q H, ZHOU J, et al. ArF excimer laser line narrowing technique[J]. Laser & Optoelectronics Progress,2009(12):46-51 (in Chinese) .
[2]	DUFFEY T P,BLUMENSTOCK G M,FLEUROV V B, et al. Next-generation 193nm laser for sub-100nm lithography[C]//26th Annual International Symposium on Microlithography. Santa Clara, California,USA:International Society for Optics and Photonics, 2001: 1202-1209.
[3]	PAETZEL R, ALBRECHT H S, LOKAI P, et al. Excimer lasers for superhigh NA 193nm lithography[C]//Microlithography 2003. Santa Clara, California,USA: International Society for Optics and Photonics, 2003: 1665-1671.
[4]	ISHIHARA T, BESAUCELE H, MALEY C A, et al. Long-term reliable operation of a MOPA-based ArF light source for microlithography[J].Proceedings of the SPIE, 2004,5377:1858-1865.
[5]	YU Y Sh,YOU L B,LIANG X, et al. Progress of excimer lasers technology[J]. Chinese Journal of Lasers, 2010, 37(9): 2253-2270(in Chinese).
[6]	WANG X J,MA W Y,TANG X Zh, et al. Synchronization control of electron beam pumped KrF laser MOPA system[J]. High Power Laser and Particle Beams,1999,11(6):663-667(in Chinese).
[7]	ERSHOV A I, NESS R M. Timing control for two-chamber gas discharge laser system: USA,6865210[P]. 2005-03-08.
[8]	FLEUROV V, ROKITSKI S, BERGSTEDT R, et al. XLR 600i: recirculating ring ArF light source for double patterning immersion lithography[J].Proceedings of the SPIE, 2008,6924:69241.
[9]	FLEUROV V B, COLON III D J, BROWN D J W, et al. Dual-chamber ultra line-narrowed excimer light source for 193nm lithography[J].Proceedings of the SPIE,2003,5040:1694-1703.
[10]	NESS R M, MELCHER P C, SAETHRE R B. Timing and synchronization of solid state pulsed power modules (SSPPM) for excimer laser applications[C]//Power Modulator Symposium,2002 and 2002 High-Voltage Workshop. New York, USA: IEEE, 2002: 525-528.
[11]	GOVORKOV S V, KNYSH A N, WIESSNER A O. MOPA excimer or molecular fluorine laser system with improved synchronization: USA, 7366213[P]. 2008-04-29.
[12]	CYMER INC. Timing control of dual-chambers gas discharge laser system: CN, 100350686C[P].2007-11-21 (in Chinese).
[13]	YANG P, WEN Y F,HU X W, et al. Design of high voltage and high frequency pulse sharpening circuit based on magnetic switch[J]. High Voltage Engineering,2006,32(2):45-47(in Chinese).
[14]	BARRETT D M. Magnetic pulse compression techniques for non-thermal plasma discharge applications[C]//Industry Applications Conference,1996,Thirty-first 1AS annual Meeting.New York,USA:IEEE,1996:2065-2070.

Synchronous control for MOPA excimer laser systems

Abstract

References

Proportional views

通讯作者: 陈斌, bchen63@163.com

Proportional views