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Volume 36 Issue 6
Sep.  2012
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Study on energy control algorithm for high-repetition-rate ArF excimer lasers

  • Corresponding author: FANG Xiao-dong, xdfang@aiofm.ac.cn
  • Received Date: 2012-04-06
    Accepted Date: 2012-04-11
  • In order to achieve the pulse energy stability of high-repetition-rate ArF excimer lasers,the technology of pulse energy control was studied from the perspective of power supply adjustment.The closed-loop control principle for pulse energy stability of high-repetition-rate ArF excimer lasers was introduced.The function model between the output energy of excimer laser and the discharge voltage was established with approximation method,and the proportion-integration(PI) algorithm for real-time adjustment of discharge voltage based on the real-time detection of pulse energy was proposed.combined with the function model and the control algorithm,simulation was carried out with MATLAB software.The simulation results indicate that the pulse energy model is reasonable and the PI algorithm is feasible for improving the laser pulse energy stability.
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  • [1]

    SAITO T,SUZUKI T,MASAYA Y,et al.Ultra line-narrowed ArF excimer laser G42A for sub-90nm lithography[J].Proceedings of SPIE,2003,5040:1704-1711.
    [2]

    MIAO X Q,HU L L,CHEN H,et al.Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond[J].Proceedings of SPIE,2008,6924: 69240A/1-69240A/8.
    [3]

    SAITO T,MATSUNAGA T,MITSUHASHI K,et al.Ultra-narrow bandwidth 4kHz ArF excimer laser for 193nm lithography[J].Proceedings of SPIE,2001,4346:1229-1237.
    [4]

    KUMAZAKI T,SUZUKI T,TANAKA S,et al.Reliable high power injection locked 6kHz 60W laser for ArF immersion lithography[J]. Proceedings of SPIE,2008,6924:2R1-2R10.
    [5]

    KAKIZAKI K,SASAKI Y,INOUE T.High-repetition-rate(6kHz) and long-pulse-duration(50ns)ArF excimer laser for sub-65nm lithography[J].Review of Scientific Instruments,2006,77(3): 035109/1-035109/6.
    [6]

    BASTING D.Excimer laser technology:laser sources,optics,systems and applications[M].Gttingen,Germany:Lambda Physik AG, 2001:56-57,256-257.
    [7]

    LIANG X,YOU L B,HUANG D W.Excimer gas charging system based on microprocessor[J].Laser Journal,2010,31(1):32-33(in Chinese).
    [8]

    LIANG X,YOU L B,YU Y Sh,et al.Excimer pulse energy stabilization realized by charging voltage real-time adjusting[J].Chinese Jourmal of Lasers,2010,37(2):374-378(in Chinese).
    [9]

    YOU L B,LIANG X,YU Y Sh,et al.Design and experimental study of all solid state pulse power module for excimer laser[J].High Power Laser and Particle Beams,2009,21(11):1750-1754(in Chinese).
    [10]

    PFLANZ T,HUBER H.compact excimer laser light source for optical(mask)inspection systems[J].Proceedings of SPIE,2001, 4349:180-184.
    [11]

    DELMDAHL R F,NIKOLAUS B.Solid-state pulsed high-repetition rate excimer lasers[J].Proceedings of SPIE,2004,5339:284-291.
    [12]

    BROWN D J W,KEEFFE P O,FLEUROV V B,et al.XLR500i: recirculating ring ArF light source for immersion lithography[J]. Proceedings of SPIE,2007,6520:652020.
    [13]

    FLEUROV V,ROKITSKI S,BERGSTEDT R,et al.XLR 600i:recirculating ring ArF light source for double patterning immersion lithography[J].Proceedings of SPIE,2008,6924:1R1-1R5.
    [14]

    YOSHINO M,NAKARAI H,OHTA T,et al.High-power and highenergy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography[J].Proceedings of SPIE,2008,6924:2S1-2S10.
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Study on energy control algorithm for high-repetition-rate ArF excimer lasers

    Corresponding author: FANG Xiao-dong, xdfang@aiofm.ac.cn
  • 1. Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China

Abstract: In order to achieve the pulse energy stability of high-repetition-rate ArF excimer lasers,the technology of pulse energy control was studied from the perspective of power supply adjustment.The closed-loop control principle for pulse energy stability of high-repetition-rate ArF excimer lasers was introduced.The function model between the output energy of excimer laser and the discharge voltage was established with approximation method,and the proportion-integration(PI) algorithm for real-time adjustment of discharge voltage based on the real-time detection of pulse energy was proposed.combined with the function model and the control algorithm,simulation was carried out with MATLAB software.The simulation results indicate that the pulse energy model is reasonable and the PI algorithm is feasible for improving the laser pulse energy stability.

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