[1] BACK C A,AUFFMAN R L K,BELL P M,et al.Characterizationof nova plasmas using an X-ray spectrometer with temporal and spatial resolution[J].Review of Scientific Instruments,1995,66(1):764-766.
[2] SHEALY D L.Design and analysis of a Schwarzschild imaging multiplayer X-ray microscope[J].Optical Engineering,1990,29(7):721-727.
[3] SAYRE D.Potential operating region for ultrasoft X-ray microscopy of biological materials[J].Science,1977,196(4296):1399-1340.
[4] WALKER A B C,LINDBLOM J F,TIMOTHY J G,et al.The ultra high resolution XUV spectroheliograph[J].Optical Engineering,1990,29(7):699-710.
[5] GUTMAN G.High-performance Mo/Si and W/B4C multilayer mirrors for soft X-ray imaging optics[J].Journal of X-Ray Science Technology,1994,4(2):142-150.
[6] SKULINA K M,ALFORD C,BIOTA R M,et al.Molybdenum/Beryllium multilayer mirrors for normal incidence in the extreme ultraviolet[J].Applied Optics,1995,34(19):3727-3730.
[7] STEARNS D G,ROSEN R S,VERNON S P.Normal-incidence X-ray mirror for 7nm[J].Optics Letters,1991,16(16):1283-1285.
[8] MONTCALM C,SULLIVAN B T,DUGUAY S,et al.In situ reflectance measurements of soft-X-ray/extreme-ultraviolet Mo/Y multilayer mirrors[J].Optics Letters,1995,20(12):1450-1452.
[9] SEELY J F,GUTMAN G,WOOD J,et al.Normal-incidence reflectance of W/B4C multilayer mirrors in the 34~50 wavelength region[J].Applied Optics,1993,32(19):3451-3543.
[10] FEDORENKO A I,KONDRATENKO V V,PERSHIN Y P,et al.Synthesis and measurement of normal incidence X-ray multilayer mirrors optimized for a photon energy of 390eV[J].Proceedings of SPIE,1994,2012:198-208.
[11] SONG M D,LI R J,ZHOU J L,et al.An new method to design high reflectivity film[J].Journal of Optoelectronics Laser,2000,11 (1):62-64.
[12] SONG L M.Design and fabrication on soft X-ray multilayer mirror[D].Dalian:Dalian University of Technology,2002:12-15(in Chinese).
[13] SHAO J D,YI K,FAN Zh X,et al.Theoretic design of multilayers for soft X-rays(1~30nm)[J].Chinese Journal of Lasers,1999,26(12):1127-1132(in Chinese).