用于平板显示LTPS制备的ELA光束整形系统

尹广玥; 游利兵; 方晓东

doi:10.7510/jgjs.issn.1001-3806.2016.03.017

用于平板显示LTPS制备的ELA光束整形系统

1.
中国科学院安徽光学精密机械研究所, 合肥 230031

作者简介: 尹广玥(1988-),男,硕士研究生,主要研究方向为准分子激光技术。.

通讯作者: 方晓东, xdfang@aiofm.ac.cn

中图分类号: TN205

ELA-beam shaping systems for flat panel display prepared by LTPS

1.
Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Science, Hefei 230031, China

Corresponding author: FANG Xiaodong, xdfang@aiofm.ac.cn

CLC number: TN205

摘要: 介绍了多晶硅薄膜较非晶硅薄膜在平板显示领域的优势以及准分子激光晶化制备多晶硅膜的结晶过程。介绍了透镜阵列实现匀光的原理。阐述了典型的准分子激光退火线型光束整形系统的扩束、匀光、投影等结构。并介绍了连续横向固化技术在准分子激光制备低温多晶硅领域的应用。讨论了准分子激光退火光学系统的发展现状,指出了其在平板显示行业的重要意义。
- 激光技术 /
- 平板显示 /
- 准分子激光退火 /
- 低温多晶硅 /
- 光束整形 /
- 匀光
Abstract: The advantages to poly silicon film instead of amorphous silicon film in the field of flat panel display were introduced. Crystallization process of poly silicon film by using excimer laser crystallization system was studied. The principle of how lens array achieve the uniformity of output laser energy density was described. The structure of typical excimer laser annealing(ELA) line beam shaping system, which included beam expanding unit, beam energy homogenizing unit, projection unit and so on was focused on. Finally the application of sequential lateral solidification technology in the area of low temperature poly silicon(LTPS) using excimer laser nnealing was introduced. The status of ELA optical system was discussed and its significance in flat panel display industry was pointed out.
- laser technique /
- flat panel display /
- excimer laser annealing /
- low temperature poly silicon /
- beam shaping /
- beam homogenization

[1]	YIN S, LIU C, ZHONG Z Y, et al. The development of low temperature poly-Si TFT technology[J]. Advanced Display,2003, 35(1):33-37(in Chinese).
[2]	IM J S, KIM H J, THOMPSON M O. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films[J]. Applied Physics Letters, 1993, 63(14):1969-1971.
[3]	MARIUCCI L, CARLUCCIO R, PECORA A, et al. Lateral growth control in excimer laser crystallized polysilicon[J]. Thin Solid Films, 1999, 337(1):137-142.
[4]	YAN Y J, DAI Y B, WANG J, et al. Progress in the research of poly Si film for TFT prepared by excimer laser crystallization[J]. Micro-electronics, 2006, 36(1):70-74(in Chinese).
[5]	SPOSILI R S, IM J S. Sequential lateral solidification of thin silicon films on SiO2[J]. Applied Physics Letters, 1996, 69(19):2864-2866.
[6]	LI H X, LOU Q H, DONG J X, et al. A novel homogenizer to improve the excimer laser beam uniformity[J]. Chinese Journal of Lasers, 2004, 31(7):785-788(in Chinese).
[7]	LI C D, CHEN T, ZUO T C. Design of fly's eye homogenizer for excimer laser micromachining[J]. Chinese Journal of Lasers, 1999, 26(6):560-564(in Chinese).
[8]	KUANG L J, ZHAI J H, RUAN Y, et al. Characteristics of fly-eye lens in uniform illumination system[J]. Optics Optoelectronic Technology, 2005, 3(6):29-31(in Chinese).
[9]	HUANG W, YU H Y, LI Y. Effect of relative position error in microlens arrays pair on beam homogenization[J]. Laser Technology, 2013, 37(1):11-15(in Chinese).
[10]	KAHLERT H J, BURGHARDT B, SIMON F, et al. High resolution optics for thin Si-film crystallization using excimer lasers:present status and future development[J].Proceedings of the SPIE, 2003, 5004:20-27.
[11]	FIEBIG M, OSMANOV R, STAMM U, et al. High-power excimer lasers for high-throughput poly-Si annealing[J].Proceedings of the SPIE,2000, 3888:464-469.
[12]	FECHNER B, SCHIWEK M, KAHLERT H J, et al. 300W XeClexcimerlaser annealing and sequential lateral solidification in low temperature poly silicon technology[J].Proceedings of the SPIE,2003, 4830:283-286.
[13]	YAMAZAKI S, TERAMOTO S, KUSUMOTO N, et al. Apparatus and method for laser radiation:US Patent 6215595[P]. 2001-04-10.
[14]	YAMAZAKI S, TANAKA K, TERAMOTO S. Laser irradiation apparatus:US Patent 6441965[P]. 2002-08-27.
[15]	TANAKA K. Laser irradiation apparatus and method:US Patent 6104535[P]. 2000-08-15.
[16]	IM J S, SPOSILI R S, CROWDER M A. Single-crystal Si films for thin-film transistor devices[J]. Applied Physics Letters, 1997, 70(25):3434-3436.
[17]	VOUTSAS A T, LIMANOV A, IM J S. Effect of process parameters on the structural characteristics of laterally grown, laser-annealed polycrystalline silicon films[J]. Journal of Applied Physics, 2003, 94(12):7445-7452.
[18]	CROWDER M A, VOUTSAS A T, DROES S R, et al. Sequential lateral solidification processing for polycrystalline Si TFTs[J].IEEE Transactions on Electron Devices,2004, 51(4):560-568.

[1]	李殿军 , 梁思远 , 曹建建 . 非球面伽利略扩束系统实现激光束空间整形. 激光技术, 2008, 32(4): 427-429.
[2]	郭明秀 , 沈冠群 , 陆雨田 . 激光二极管光束整形技术. 激光技术, 2003, 27(4): 357-361.
[3]	潘圆圆 , 崔瑞祯 , 陈刚 , 巩马理 , 黄磊 . 用于半导体激光器的棱镜组光束整形方法. 激光技术, 2006, 30(4): 370-372,376.
[4]	任驹 , 李四川 , 李航 , 陈培锋 , 夏惠军 , 周桂勇 , 彭杰 . 基于双轴锥镜的环形激光束整形. 激光技术, 2018, 42(1): 104-107. doi: 10.7510/jgjs.issn.1001-3806.2018.01.020
[5]	吴政南 , 谢江容 , 杨雁南 . 高功率半导体激光器光束整形的设计和实现. 激光技术, 2017, 41(3): 416-420. doi: 10.7510/jgjs.issn.1001-3806.2017.03.022
[6]	张世鑫 , 赵爽 , 王一璋 , 周哲海 . 自由曲面透镜白光LED光束整形技术. 激光技术, 2021, 45(3): 357-361. doi: 10.7510/jgjs.issn.1001-3806.2021.03.016
[7]	张健 , Hollinger Franz . 耦合半导体激光进入光纤. 激光技术, 1996, 20(3): 129-132.
[8]	李姝妺 , 王英 , 胡阿健 , 陈培锋 . 一种形成环形抽运光的方法. 激光技术, 2015, 39(5): 621-624. doi: 10.7510/jgjs.issn.1001-3806.2015.05.008
[9]	娄艳阳 , 郑贤良 , 张世超 , 鹿伟民 , 李辉 , 熊大曦 . 基于数字微镜阵列的平顶光束空间整形. 激光技术, 2016, 40(6): 916-920. doi: 10.7510/jgjs.issn.1001-3806.2016.06.029
[10]	李琦 , 王骐 , 高惠德 . 输入光束光斑半径变化对BOE整形环的影响. 激光技术, 2002, 26(1): 35-37,40.
[11]	李琦 , 高惠德 , 董蕴华 , 申作春 , 王骐 . 整形二元光学元件衍射效率的研究. 激光技术, 2000, 24(1): 30-33.
[12]	张浩 , 樊红英 , 赵琦 , 蒋泽伟 , 孟庆安 , 欧阳刚 , 陈好 . 基于非球面镜组的大口径激光匀化技术研究. 激光技术, 2023, 47(3): 340-344. doi: 10.7510/jgjs.issn.1001-3806.2023.03.009
[13]	王平江 , 吴浩 , 陈吉红 , 唐小琦 . 动光式激光切割无缝拼接技术的研究与应用. 激光技术, 2009, 33(4): 369-373. doi: 10.3969/j.issn.1001-3806.2009.04.010
[14]	龙芋宏 , 熊良才 , 史铁林 . 水辅助准分子激光微加工硅的实验研究. 激光技术, 2006, 30(6): 567-569.
[15]	龙芋宏 , 熊良才 , 史铁林 , 柳海鹏 . 准分子激光电化学刻蚀硅的刻蚀质量研究. 激光技术, 2006, 30(3): 235-237.
[16]	段国平 , 陈俊领 , 周德让 , 韩俊鹤 , 黄明举 . 本征非晶硅薄膜的准分子激光晶化. 激光技术, 2013, 37(2): 151-154. doi: 10.7510/jgjs.issn.1001-3806.2013.02.004
[17]	王振 , 韩蒙蒙 , 彭浩 , 唐霞辉 . 射频板条CO2激光器整形光路自适应调节研究. 激光技术, 2015, 39(4): 471-475. doi: 10.7510/jgjs.issn.1001-3806.2015.04.009
[18]	王忠凯 , 毕建民 , 周昕 , 陈建国 , 陈涌 , 杨泽后 , 孙鹏 . 激光多普勒双光束横向测速技术研究. 激光技术, 2006, 30(2): 183-185.
[19]	肖海兵 , 张庆茂 , 谭小军 , 周泳全 , 张卫 , 罗博伟 . 碳化硅陶瓷超快激光双光束精密抛光技术研究. 激光技术, 2024, 48(2): 180-187. doi: 10.7510/jgjs.issn.1001-3806.2024.02.006
[20]	蒋志伟 , 龚时华 , 王启行 . 双光束激光双路焊接的跟踪控制技术研究. 激光技术, 2013, 37(1): 1-5. doi: 10.7510/jgjs.issn.1001-3806.2013.01.001

点击查看大图

计量

文章访问数: 5764
HTML全文浏览量: 3477
PDF下载量: 571
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

留言板

用于平板显示LTPS制备的ELA光束整形系统

作者简介: 尹广玥(1988-),男,硕士研究生,主要研究方向为准分子激光技术。.

通讯作者: 方晓东, xdfang@aiofm.ac.cn

ELA-beam shaping systems for flat panel display prepared by LTPS

Corresponding author: FANG Xiaodong, xdfang@aiofm.ac.cn

计量

用于平板显示LTPS制备的ELA光束整形系统

通讯作者: 方晓东, xdfang@aiofm.ac.cn

作者简介: 尹广玥(1988-),男,硕士研究生,主要研究方向为准分子激光技术。

English Abstract

ELA-beam shaping systems for flat panel display prepared by LTPS

Corresponding author: FANG Xiaodong, xdfang@aiofm.ac.cn

全文HTML

目录

留言板

用于平板显示LTPS制备的ELA光束整形系统

作者简介: 尹广玥(1988-),男,硕士研究生,主要研究方向为准分子激光技术。.

通讯作者: 方晓东, xdfang@aiofm.ac.cn

ELA-beam shaping systems for flat panel display prepared by LTPS

Corresponding author: FANG Xiaodong, xdfang@aiofm.ac.cn

计量

出版历程

用于平板显示LTPS制备的ELA光束整形系统

通讯作者: 方晓东, xdfang@aiofm.ac.cn

作者简介: 尹广玥(1988-),男,硕士研究生,主要研究方向为准分子激光技术。

English Abstract

ELA-beam shaping systems for flat panel display prepared by LTPS

Corresponding author: FANG Xiaodong, xdfang@aiofm.ac.cn

全文HTML

目录