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193nm薄膜激光诱导损伤研究

常艳贺 金春水 邓文渊 李春

引用本文:
Citation:

193nm薄膜激光诱导损伤研究

    作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。.
    通讯作者: 金春水, Jin_chunshui@yahoo.com.cn
  • 中图分类号: O484

Study on laser induced damage of coating at 193nm

    Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn ;
  • CLC number: O484

  • 摘要: 概述了193nm薄膜激光诱导损伤的研究进展。通过对紫外到深紫外波段几种典型薄膜损伤形貌的介绍,对比分析了193nm薄膜激光诱导损伤的可能原因。指出在该波段的氧化物薄膜损伤中,吸收是导致薄膜大块损伤的重要因素,而氟化物的薄膜损伤则是由沉积过程的膜层局部缺陷造成。根据薄膜样品的损伤分析表明,薄膜的某些制备参量与激光损伤阈值相关联。为提高薄膜元件的抗激光损伤能力,分别从薄膜材料的选择、膜系设计的完善以及沉积工艺的优化等3个方面出发,总结出改善薄膜激光损伤阈值的方法。
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  • 收稿日期:  2010-07-14
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  • 刊出日期:  2011-05-25

193nm薄膜激光诱导损伤研究

    通讯作者: 金春水, Jin_chunshui@yahoo.com.cn
    作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。
  • 1. 中国科学院 长春光学精密机械与物理研究所 应用光学国家重点实验室, 长春 130033;
  • 2. 中国科学院 研究生院, 北京 100039

摘要: 概述了193nm薄膜激光诱导损伤的研究进展。通过对紫外到深紫外波段几种典型薄膜损伤形貌的介绍,对比分析了193nm薄膜激光诱导损伤的可能原因。指出在该波段的氧化物薄膜损伤中,吸收是导致薄膜大块损伤的重要因素,而氟化物的薄膜损伤则是由沉积过程的膜层局部缺陷造成。根据薄膜样品的损伤分析表明,薄膜的某些制备参量与激光损伤阈值相关联。为提高薄膜元件的抗激光损伤能力,分别从薄膜材料的选择、膜系设计的完善以及沉积工艺的优化等3个方面出发,总结出改善薄膜激光损伤阈值的方法。

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